Prog Med Phys.  2020 Dec;31(4):163-171. 10.14316/pmp.2020.31.4.163.

Improvement of Calculation Accuracy in the Electron Monte Carlo Algorithm with Optional Air Profile Measurements

Affiliations
  • 1Department of Radiation Oncology, Seoul National University Hospital, Seoul, Korea
  • 2Biomedical Research Institute, Seoul National University Hospital, Seoul, Korea
  • 3Institute of Radiation Medicine, Seoul National University Medical Research Center, Seoul, Korea
  • 4Department of Radiation Oncology, Seoul National University College of Medicine, Seoul, Korea

Abstract

Purpose
In this study, the accuracies of electron Monte Carlo (eMC) calculation algorithms were evaluated to determine whether electron beams were modeled by optional air profiles (APs) designed for each applicator size.
Methods
Electron beams with the energies of 6, 9, 12, and 16 MeV for VitalBeam (Varian Medical System, Palo Alto, CA, USA) and 6, 9, 12, 16, and 20 MeV for Clinac iX (Varian Medical System) were used. Optional APs were measured at the source-to-detector distance of 95 cm with jaw openings appropriate for each machine, electron beam energy, and applicator size. The measured optional APs were postprocessed and converted into the w2CAD format. Then, the electron beams were modeled and calculated with and without optional APs. Measured profiles, percentage depth doses, penumbras with respect to each machine, and energy were compared to calculated dose distributions.
Results
For VitalBeam, the profile differences between the measurement and calculation were reduced by 0.35%, 0.15%, 0.14%, and 0.38% at 6, 9, 12, and 16 MeV, respectively, when the beams were modeled with APs. For Clinac iX, the differences were decreased by 0.16%, -0.31%, 0.94%, 0.42%, and 0.74%, at 6, 9, 12, 16, and 20 MeV, respectively, with the insertion of APs. Of note, no significant improvements in penumbra and percentage depth dose were observed, although the beam models were configured with APs.
Conclusions
The accuracy of the eMC calculation can be improved in profiles when electron beams are modeled with optional APs.

Keyword

Electron Monte Carlo; Air profile measurement; Electron applicator; Beam configuration; Eclipse treatment planning system

Figure

  • Fig. 1 Schematic diagrams of the measurement setup for (a) optional air profiles and (b) verifications.

  • Fig. 2 Measured and calculated profiles with and without air profiles (APs) for VitalBeam: (a, c) in-line and (b, d) cross-line profiles at 6 and 16 MeV, respectively.

  • Fig. 3 Measured and calculated profiles with and without air profiles (APs) for Clinac iX: (a, c) in-line and (b, d) cross-line profiles at 6 and 20 MeV, respectively.

  • Fig. 4 Comparison of the measured and calculated percentage depth dose (PDD) curves with and without air profiles (Aps) and corresponding dose differences at (a) 6 and (c) 16 MeV for VitalBeam and at (b) 6 and (d) 20 MeV for Clinac iX. Calculation with AP–measurement, difference between the calculation with AP and measurement value; Calculation without AP–measurement, difference between the calculation without AP and measurement value.


Reference

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